Thin Films Technology

This book deals with key aspects of modelling, deposition and characterization of thin solid films. The main attention is paid to the physical vacuum deposition methods and particularly to the magnetron sputtering. Measurement methods for optical and electrical properties of thin films, that are described in the book, are based on the equipment situated in the thin-films laboratory of the Holon Institute of Technology (HIT). The book is written based on Dr Axelevitch's long experience (more than 30 years) in the field. It is mainly intended for students of microelectronics, electrooptics and nanotechnology specialties, as well as for practical engineers.

Contents:

• Abstract
• Preface
• Preparation of the Experiments
• Gas Laws and Vacuum Technique
• Physical Vacuum Deposition, Sputtering
• Experiment Planning, Optimization and Data Presentation
• Optical Properties and Thickness of Thin Films
• Electrical Properties of Thin Films
• Bibliography
• Index

Readership: Student, researchers and professional in the fields of micro and optoelectronics, thin films deposition, thin film properties, semiconductor physics and renewable energy sources, solar cells.
Key Features:

• This book can be served as a basic material for the courses "Thin films technologies", "Laboratory of Thin Films", "Application of Thin Films in Nanotechnology" for undergraduate and graduate students. Also, the book contains auxiliary materials for the courses "Microelectronics Technology", "Semiconductor Basics", "Semiconductor Devices"
• This book contains information devoted to the experiment planning and the physical vacuum deposition of metal, dielectric and semiconductor thin films, which may be used within planar technology industry
• Special attention is paid to practical aspects of measurement of electrical and optical properties of deposited thin films and semiconductor devices

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